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	<pubDate>Sun, 10 Aug 2008 05:42:49 +0000</pubDate>
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		<title>An Improved Purification Method for Preparation</title>
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		<pubDate>Sun, 10 Aug 2008 05:42:49 +0000</pubDate>
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		<description><![CDATA[The adsorption mechanism of Na+,Cl-and other impurities on the surface of basic nickel carbonate was clarified by electric double layer model.Based on the mechanism,a new purification method was studied.The method can be described as washing-drying-rewashing-drying.The experimental results indicate that the process is very efficient to remove impurities adsorbed by the precipitate when using NiCl 2 [...]]]></description>
			<content:encoded><![CDATA[<p>The adsorption mechanism of Na+,Cl-and other impurities on the surface of basic nickel carbonate was clarified by electric double layer model.Based on the mechanism,a new purification method was studied.The method can be described as washing-drying-rewashing-drying.The experimental results indicate that the process is very efficient to remove impurities adsorbed by the precipitate when using NiCl 2 and Na 2 CO 3 as the raw materials.The finished product’s contents of sodium and chlorine are both less than 0.01 wt%.</p>
<p>      　1 Introduction High pure basic nickel carbonate is a kind of significant material for electronic industry.The preparation via chemical precipitation in electrolytes solutions is widely applied.But it is very difficult to get high pure products,particularl…</p>
<p>      The adsorption mechanism of Na+,Cl-and other impurities on the surface of basic nickel carbonate was clarified by electric double layer model.Based on the mechanism,a new purification method was studied.The method can be described as washing-drying-rewashing-drying.The experimental results indicate that the process is very efficient to remove impurities adsorbed by the precipitate when using NiCl 2 and Na 2 CO 3 as the raw materials.The finished product’s contents of sodium and chlorine are both less than 0.01 wt%.<font color="white"><!--61077fd6cb7e10e354ef6c1952aade21--></font><br />Related Topics:
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		<pubDate>Sun, 10 Aug 2008 05:18:03 +0000</pubDate>
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